Publications

PUBLICATIONS from The SHARP EUV Microscope and its predecessor, The AIT.

    2016

  1. Aamod Shanker, Antoine Wojdyla, Gautam Gunjala, Jonathan Dong, Markus Benk, Andy Neureuther, Kenneth Goldberg, Laura Waller, "Off-axis aberration estimation in an EUV microscope using natural speckle," 2016 Imaging and Applied Optics Congress ITh1F.2, (2016). DOI 10.1364/ISA.2016.ITh1F.2 [PDF]
  2. Markus P. Benk, Antoine Wojdyla, Weilun Chao, Farhad Salmassi, Sharon Oh, Yow-Gwo Wang, Ryan H. Miyakawa, Patrick P. Naulleau, and Kenneth A. Goldberg, "Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope," J. Micro/Nanolith. MEMS MOEMS 15 (3), 033501 (2016). DOI 10.1117/1.JMM.15.3.033501 [PDF]
  3. Zachary Levinson, Erik Verduijn, Obert R. Wood, Pawitter Mangat, Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, Bruce W. Smith, "Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology," J. Micro/Nanolith. MEMS MOEMS 15 (2), 023508 (2016). DOI 10.1117/1.JMM.15.2.023508 [PDF]
  4. Patrick Naulleau, Christopher N. Anderson, Weilun Chao, Kenneth A. Goldberg, Eric Gullikson, Farhad Salmassi, Antoine Wojdyla, "Ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask," SPIE 9984 99840P, (2016). DOI 10.1117/12.2243321 [PDF]
  5. Zhengqing John Qi, Jed H. Rankin, Mark Lawliss, Karen D. Badger, Christina Turley, "Toward defect-free fabrication of extreme ultraviolet photomasks," J. Micro/Nanolith. MEMS MOEMS 15 (2), 1-7 (2016). DOI 10.1117/1.JMM.15.2.023502 [PDF]
  6. Zac Levinson, Jack S. Smith, Germain Fenger, Bruce W. Smith, "An Automated Image-Based Tool for Pupil Plane Characterization of EUVL Tools," SPIE 9776 97762M, (2016). DOI 10.1117/12.2219704 [PDF]
  7. Markus P. Benk, Antoine Wojdyla, Weilun L. Chao, Ryan H. Miyakawa, Patrick P. Naulleau, Kenneth A. Goldberg, "Emulation of anamorphic imaging on the SHARP EUV mask microscope," SPIE 9776 97761J, (2016). DOI 10.1117/12.2219294 [PDF]
  8. Yow-Gwo Wang, Andrew R. Neureuther, Patrick P. Naulleau, "Enhancing native defect sensitivity for EUV actinic blank inspection: optimized pupil engineering and photon noise study," SPIE 9776 97761D, (2016). DOI 10.1117/12.2220277 [PDF]
  9. Antoine Wojdyla, Markus P. Benk, Kenneth A. Goldberg, "Fourier Ptychography imaging for the study of EUV lithography photomasks," SPIE February 24, 2016.
  10. Zac Levinson, Andrew Burbine, Erik A. Verduijn, Obert R. Wood II, Pawitter J. Mangat, Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, "Image-based pupil plane characterization via principal component analysis for EUVL tools," SPIE 9776 977618, (2016). DOI 10.1117/12.2219745 [PDF]
  11. Antoine Wojdyla, Alexander P. Donoghue, Markus P. Benk, Kenneth A. Goldberg, "Aerial imaging study of the mask-induced line-edge roughness of EUV lithography mask," SPIE 9776 97760H, (2016). DOI 10.1117/12.2219513 [PDF]
  12. 2015

  13. Patrick Naulleau, Christopher Anderson, Weilun Chao, Kenneth Goldberg, Antoine Wojdyla, Suchit Bhattarai, Andrew Neureuther, Frank Goodwin, Mark Neisser, "Enabling EUV Resist Research at the 1x and Smaller Regime," J. Photopolym. Sci. Technol. 28 (6), 777-82 (2015). DOI 10.2494/photopolymer.28.777 [PDF]
  14. Takeshi Isogawa, Kazunori Seki, Mark Lawliss, Zhengqing John Qi, Jed Rankin, Shinji Akima, "Evaluation of multilayer defect repair viability and protection techniques for EUV masks," SPIE 9635 963518, (2015). DOI 10.1117/12.2197761 [PDF]
  15. Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, Erik Verduijn, Obert R. Wood III, and Pawitter Mangat, "EUV actinic brightfield mask microscopy for predicting printed defect images," SPIE 9635 963514, (2015). DOI 10.1117/12.2196966 [PDF]
  16. Rene A. Claus, Yow-Gwo Wang, Antoine Wojdyla, Markus P. Benk, Kenneth A. Goldberg, Andrew R. Neureuther, Patrick P. Naulleau, "Examination of phase retrieval algorithms for patterned EUV mask metrology," SPIE 9635 96350F, (2015). DOI 10.1117/12.2197868 [PDF]
  17. Antoine Wojdyla, Alexander Donoghue, Markus P. Benk, Kenneth A. Goldberg, Patrick P. Naulleau, "Using the SHARP EUV Microscope's aerial images to study line edge roughness," 2015 International Symposium on EUV Lithography, Maastricht, The Netherlands October 5, 2015.
  18. Markus Benk, Antoine Wojdyla, Kenneth Goldberg, Patrick Naulleau, "Actinic mask imaging: Taking a SHARP look at next generation photomasks," 2015 International Symposium on EUV Lithography, Maastricht, The Netherlands October 7, 2015.
  19. Erik Verduijn, Erik Hosler, Pawitter Mangat, Obert Wood, Renzo Capelli, Sascha Perlitz, Krister Magnusson, Markus Weiss, Dirk Hellweg, Vibhu Jindal, Markus P. Benk, Antoine Wojdyla, Kenneth A. Goldberg, "Assessment of AIMS™ EUV and SHARP actinic wavelength mask defect review tools for the evaluation of blank defect printability," 2015 International Symposium on EUV Lithography, Maastricht, The Netherlands October 5, 2015.
  20. Patrick P. Naulleau, Christopher N. Anderson, Weilun Chao, Peter Fischer, Kenneth A. Goldberg, Eric M. Gullikson, Ryan Miyakawa, Seong-Sue Kim, Donggun Lee and Jongju Park, "EUV Research at Berkeley Lab: Enabling Technologies and Applications," X-Ray Lasers 2014: Proceedings of the 14th International Conference on X-Ray Lasers (2015). [PDF]
  21. Pawitter Mangat, Erik Verduijn, Obert R. Wood II, Markus P. Benk, Antoine Wojdyla, and Kenneth A. Goldberg, "Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging," SPIE 9658 96580E, (2015). DOI 10.1117/12.2201048 [PDF]
  22. Markus P. Benk, Kenneth A. Goldberg, Antoine Wojdyla, Christopher N. Anderson, Farhad Salmassi, Patrick P. Naulleau, and Michael Kocsis, "Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope," Journal of Vacuum Science and Technology B 33 (6), 06FE01 (2015). DOI 10.1116/1.4929509 [PDF]
  23. Rene A. Claus, Yow-Gwo Wang, Markus Benk, Kenneth A. Goldberg, Patrick P. Naulleau, Andrew R. Neureuther, and Laura Waller, "Partially Coherent Quantitative Phase Retrieval for EUV Lithography," OSA Computational Optical Sensing and Imaging (COSI) 2015 , ITH2A (2015). DOI 10.1364/ISA.2015.ITH2A.4 [PDF]
  24. Mihir Upadhyaya, Vibhu Jindal, Adarsh Basavalingappa, Henry Herbol, Jenah Harris-Jones, Il-Yong Jang, Kenneth A. Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle, Thomas V. Pistor, Gregory Denbeaux, "Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach," J. Micro/Nanolith. MEMS MOEMS 14 (2), 023505 (2015). DOI 10.1117/1.JMM.14.2.023505 [PDF]
  25. Iacopo Mochi and Kenneth Goldberg, "Modal wavefront reconstruction from its gradient," Applied Optics 54 (12), 3780-5 (2015). DOI 10.1364/AO.54.003780 [PDF]
  26. Mihir Upadhyaya, Adarsh Basavalingappa, Henry Herbol, Gregory Denbeaux, Vibhu Jindal, Jenah Harris-Jones, Il-Yong Jang, Kenneth A. Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle and Thomas V. Pistor, "Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects," Journal of Vacuum Science and Technology B 33, 021602 (2015). DOI 10.1116/1.4913315 [PDF]
  27. Martin Burkhardt, Ananthan Raghunathan, "Best Focus Shift Mechanism for Thick Masks," SPIE 9422 94220X, (2015). DOI 10.1117/12.2085948 [PDF]
  28. M. P. Benk, R. H. Miyakawa, W. Chao, Y.-G. Wang, A. Wojdyla, D. G. Johnson, A. P. Donoghue, K. A. Goldberg, "Broader view on extreme ultraviolet masks: adding complementary imaging modes to the SHARP microscope," J. Micro/Nanolith. MEMS MOEMS 14 (1), 013507 (2015). DOI 10.1117/1.JMM.14.1.013507 [PDF]
  29. Yow-Gwo Wang, Ryan Miyakawa, Weilun Chao, Markus Benk, Antoine Wojdyla, Alex Donoghue, David Johnson, Kenneth Goldberg, Andy Neureuther, Ted Liang, and Patrick Naulleau, "Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection," SPIE 9422 94221C, (2015). DOI 10.1117/12.2087532 [PDF]
  30. Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, David G. Johnson, and Alexander P. Donoghue, "New ways of looking at masks with the SHARP EUV microscope," SPIE 9422 94221A, (2015). DOI 10.1117/12.2175553 [PDF]
  31. Zac Levinson, Sudhar Raghunathan, Erik Verduijn, Obert Wood, Pawitter Mangat, Kenneth Goldberg, Markus Benk, Antoine Wojdyla, Vicky Philipsen, Eric Hendrickx, Bruce W. Smith, "A Method of Image-Based Aberration Metrology for EUVL Tools," SPIE 9422 942215, (2015). DOI 10.1117/12.2087177 [PDF]
  32. Yow-Gwo Wang, Antoine Wojdyla, Markus P. Benk, Kenneth A. Goldberg, Andrew R. Neureuther, Patrick P. Naulleau, and Laura Waller, "Phase measurements of EUV mask defects," SPIE 9422 942217, (2015). DOI 10.1117/12.2087195 [PDF]
  33. Rene A. Claus, Antoine Wojdyla, Markus P. Benk, Kenneth A. Goldberg, Andrew R. Neureuther, Patrick P. Naulleau, and Laura Waller, "Aberration estimation using EUV mask roughness," SPIE 9422 942214, (2015). DOI 10.1117/12.2087513 [PDF]
  34. Mihir Upadhyaya, Vibhu Jindal, Adarsh Basavalingappa, Henry Herbol, Jenah Harris-Jones, Il-Yong Jang, Kenneth A. Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle, Thomas V. Pistor and Gregory Denbeaux, "Evaluating Printability of Buried Native EUV Mask Phase Defects through a Modeling and Simulation Approach," SPIE 9422 94220Q, (2015). DOI 10.1117/12.2175842 [PDF]
  35. Pei-Yang Yan, Guojing Zhang, Eric M. Gullikson, Kenneth A. Goldberg, Markus P. Benk, "Understanding EUV mask blank surface roughness induced LWR and associated roughness requirement," SPIE 9422 94220J, (2015). DOI 10.1117/12.2087041 [PDF]
  36. 2014

  37. Mihir Upadhyaya, Vibhu Jindal, Henry Herbol, Il-Yong Jang, Hyuk Joo Kwon, Jenah Harris-Jones, Gregory Denbeaux, "Investigating Printability of Native Defects on EUV Mask Blanks through Simulations and Experiments," SPIE 9048 90483L, (2014). DOI 10.1117/12.2057761 [PDF]
  38. Yow-Gwo Wang, Ryan Miyakawa, Andrew Neureuther, Patrick Naulleau, "Zernike Phase Contrast Microscope for EUV mask inspection," SPIE 9048 904810, (2014). DOI 10.1117/12.2048180 [PDF]
  39. Yow-Gwo Wang, Ryan Miyakawa, Weilun Chao, Kenneth Goldberg, Andy Neureuther, Patrick Naulleau, "Phase-enhanced defect sensitivity for EUV mask inspection," SPIE 9235 92350L, (2014). DOI 10.1117/12.2069291 [PDF]
  40. Patrick Naulleau, Suchit Bhattaria, Rick Chao, Rene Claus, Kenneth Goldberg, Frank Goodwin, Eric Gullikson, Donggun Lee, Andy Neureuther, Jong-Ju Park, "Extreme ultraviolet mask roughness: requirements, characterization, and modeling," SPIE Photomask Japan 9256 92560J, (2014). DOI 10.1117/12.2070303 [PDF]
  41. Emily Gallagher, Alfred Wagner, Mark Lawliss, Gregory McIntyre, Kazunori Seki, Takeshi Isogawa, Steven Nash, "Learning from native defects on EUV mask blanks," SPIE Photomask Japan 9256 92560K, (2014). DOI 10.1117/12.2070871 [PDF]
  42. Takeshi Isogawa, Kazunori Seki, Mark Lawliss, Emily Gallagher, Shinji Akima, Toshio Konishi, "Screening EUV mask absorbers for defect repair," SPIE Photomask Japan 9256 92560N, (2014). DOI 10.1117/12.2070251 [PDF]
  43. K. A. Goldberg, M. Benk, A. Wojdyla, I. Mochi, P. Naulleau, "Actinic Mask Imaging: Emulating Current and Future Litho Tools with the SHARP EUV Microscope," SPIE Photomask Japan April 16, 2014.
  44. M. Lawliss, E. Gallagher, M. Hibbs , K. Seki, T. Isogawa, T. Robinson, J. LeClaire, "Repairing native defects on EUV mask blanks," SPIE Photomask Technology 9235 923516, (2014). DOI 10.1117/12.2069787 [PDF]
  45. Y.-G. Wang, R. Miyakawa, W. Chao, D. Johnson, A. Donoghue, A. Wojdyla, M. Benk, K. Goldberg, A. Neureuther, and P. Naulleau, "Phase-enhanced Defect Sensitivity for EUV Mask Inspection," EUVL Symposium 2014 October 28, 2014.
  46. Markus P. Benk, David G. Johnson, Alexander Donoghue, Antoine Wojdyla, Kenneth A. Goldberg, "Source optimization at the SHARP microscope," EUVL Symposium 2014 .
  47. A. Wojdyla, M. P. Benk, D. G. Johnson, A. Donoghue, K. A. Goldberg , "Fourier Ptychography Microscopy with the SHARP EUV Microscope for increased imaging resolution based on illumination diversity," EUVL Symposium 2014 .
  48. Kenneth A. Goldberg, Markus Benk, Antoine Wojdyla, Alex Donoghue, David Johnson, James Macdougall, Weilun Chao, Ryan Miyakawa, Yow-Gwo Wang, and Patrick Naulleau, "New Source and Imaging Capabilities of the SHARP EUV Mask Microscope," EUVL Symposium 2014 .
  49. Mihir Upadhyaya, Vibhu Jindal, Henry Herbol, Jenah Harris-Jones, Il-Yong Jang, Kenneth A. Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle, Thomas V. Pistor and Gregory Denbeaux, "Investigating Printability of Native Defects on EUV Mask Blanks through Simulations and Experiments," EUVL Symposium 2014 .
  50. S. Raghunathan, O. R. Wood II, P. Mangat, E. Verduijn, V. Philipsen, E. Hendrickx, R. Jonckheere, K. A. Goldberg, M. P. Benk, P. Kearney, Z. Levinson and B. W. Smith, "Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images," J. Vac. Sci. Technol. B 32, 06F801 (2014). DOI 10.1116/1.4901876 [PDF]
  51. K. Yamazoe, I. Mochi, and K. A. Goldberg, "Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent source," J. Opt. Soc. Am. A 31 (12), B34-43 (2014). DOI 10.1364/JOSAA.31.000B34 [PDF]
  52. M. P. Benk, R. H. Miyakawa, W. Chao, Y.-G. Wang, A. Wojdyla, D. G. Johnson, A. P. Donoghue, K. A. Goldberg, "A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope," SPIE Photomask, 9235 92350K, (2014). DOI 10.1117/12.2065513 [PDF]
  53. Naulleau, P., S. Bhattaria, R. Chao, R. Claus, K.A. Goldberg, F. Goodwin, E. Gullikson, D. Lee, A. Neureuther, and J.-J. Park, "Extreme ultraviolet mask roughness: requirements, characterization, and modeling," SPIE 9256 92560J, (2014). DOI 10.1117/12.2070303 [PDF]
  54. Kenneth A. Goldberg, Markus P. Benk, Antoine Wojdyla, Iacopo Mochi, Senajith B. Rekawa, Arnaud P. Allezy, Michael R. Dickinson, Carl W. Cork, Weilun Chao, Daniel J. Zehm, James B. Macdougall, Patrick P. Naulleau, and Anne Rudack, "Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope," SPIE 9048, 90480Y (2014). DOI 10.1117/12.2048364 [PDF]
  55. 2013

  56. Markus P. Benk, Iacopo Mochi, C. C. Lin, Kenneth A. Goldberg, "A sharper look at EUV masks," EUVL Symposium 2013, Toyama, Japan , (2013).
  57. Kenneth A. Goldberg, Iacopo Mochi, Markus P. Benk, Chihcheng Lin, Arnaud Allezy, Michael Dickinson, Carl W. Cork, James B. Macdougall, Erik H. Anderson, Weilun Chao, Farhad Salmassi, Eric. M. Gullikson, Daniel Zehm, Vamsi Vytla, William Cork, Jason DePonte, Gino Picchi, Ahmet Pekedis, Takeshi Katayanagi, Michael G. Jones, Elizabeth Martin, Patrick P. Naulleau, and Senajith B. Rekawa, "The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope ," SPIE 8880 88800T, (2013). DOI 10.1117/12.2026496 [PDF]
  58. Rene A. Claus, Iacopo Mochi, Markus P. Benk, Kenneth A. Goldberg, Andrew R. Neureuther, Patrick P. Naulleau, "Recovering Effective Amplitude and Phase Roughness of EUV Masks," Proc. SPIE 8880 88802B, (2013). DOI 10.1117/12.2027828 [PDF]
  59. Markus P. Benk, Kenneth A. Goldberg, Iacopo Mochi, Weilun Chao, Erik H. Anderson, "Increased depth of field through wave-front coding: using an off-axis zone plate lens with cubic phase modulation in an EUV microscope ," Proc. SPIE 8880 88801R, (2013). DOI 10.1117/12.2025954 [PDF]
  60. Iacopo Mochi, Kenneth A. Goldberg, Markus P. Benk, Patrick P. Naulleau, "Pupil shaping and coherence control in an EUV mask-imaging microscope ," Proc. SPIE 8880 888022, (2013). DOI 10.1117/12.2026498 [PDF]
  61. G. R. McIntyre, E. E. Gallagher, T. E. Robinson, Smith, A. C., M. Lawliss, J. LeClaire, R. Bozak, R. White, M. Archuletta, "Through-focus EUV multilayer defect repair with nanomachining," SPIE 8679 86791I, (2013). DOI 10.1117/12.2014935
  62. K. A. Goldberg, I. Mochi, M. Benk, A. P. Allezy, M. R. Dickinson, C. W. Cork, D. Zehm, J. B. Macdougall, E. Anderson, F. Salmassi, W. L. Chao, V. K. Vytla, E. M. Gullikson, J. C. DePonte, M. S. Jones, D. Van Camp, J. F. Gamsby, W. B. Ghiorso, H. Huang, W. Cork, E. Martin, E. Van Every, E. Acome, V. Milanovic, R. Delano, P. P. Naulleau, and S. B. Rekawa, "Commissioning an EUV mask microscope for lithography generations reaching 8 nm," SPIE 8679 867919, (2013). DOI 10.1117/12.2011688 [PDF]
  63. L. Sun, S. Raghunathan, V. Jindal, E. Gullikson, P. Mangat, I. Mochi, K. A. Goldberg, M. P. Benk, O. Kritsun, T. Wallow, D. Civay, and O. Wood, "Application of phase shift focus monitor in EUVL process control," SPIE 8679 86790T, (2013). DOI 10.1117/12.2011342 [PDF]
  64. 2012

  65. Emily Gallagher, Greg McIntyre, Mark Lawliss, Tod Robinson, Ron Bozak, Roy White, Jeff LeClaire, "EUVL mask repair: expanding options with nanomachining (Third place, Best paper award)," Proc. SPIE 8522 85221L, (2012). DOI 10.1117/12.974749
  66. K. Seki, K. Badger, E. Gallagher, T. Konishi, G. McIntyre, "Shedding light on EUV mask inspection (Best Poster Award)," Proc. SPIE 8441 844114, (2012). DOI 10.1117/12.976059
  67. K. A. Goldberg, I. Mochi, M. P. Benk, A. P. Allezy, N. S. Smith, C. W. Cork, W. Cork, J. Macdougall, W. L. Chao, E. H. Anderson, P. P. Naulleau, E. Acome, E. Van Every, V. Milanovic, S. B. Rekawa, "Creating an EUV Mask Microscope for Lithography Generations Reaching 8 nm," Precision Engineering and Mechatronics Supporting the Semiconductor Industry , 4-7 (2012). [PDF]
  68. H. J. Kwon, J. Harris-Jones, A. Cordes, M. Satake, Y. Li, I. Mochi, and K. A. Goldberg , "EUV mask multilayer defects and their printability under different multilayer deposition conditions," Proc. SPIE 8322, 832209 (2012). DOI 10.1117/12.916374 [PDF]
  69. P.-Y. Yan, I. Mochi, and K. Goldberg, "EUV Actinic Imaging Tool Aerial Image Evaluation of EUVL Embedded Phase Shift Mask Performance," Proc. SPIE 8322, 83221P (2012). DOI 10.1117/12.919710 [PDF]
  70. T.-G. Kim, H.-S. Seo, I.-Y. Kang, C. Y. Jeong, S. Huh, J. Na, S.-S. Kim, C.-U. Jeon, I. Mochi, K. A. Goldberg, "Printability Study of Pattern Defects in the EUV Mask as a Function of hp Nodes," Proc. SPIE 8322, 83220A (2012). DOI 10.1117/12.916374 [PDF]
  71. 2011

  72. P. P. Naulleau, K. A. Goldberg, E. Gullikson, I. Mochi, B. McClinton, and A. Rastegar, "Accelerating EUV learning with synchrotron light: mask roughness challenges ahead," Proc. SPIE 8166, 81660F (2011). DOI 10.1117/12.900488 [PDF]
  73. H.-J. Kwon, J. Harris-Jones, T. Ranganath, A. Cordes, T. Nakajima, I. Mochi, K. A. Goldberg, Y. Yamaguchi, and H. Kinoshita, "Printability of native blank defects and programmed defects and their stack structures," Proc. SPIE 8166, 81660H (2011). DOI 10.1117/12.897165 [LINK]
  74. A. J. R. van den Boogaard, E. Louis, E. Zoethout, K. A. Goldberg, F. Bijkerk, "Characterization of Mo/Si multilayer growth on stepped topographies," J. Vac. Sci. & Technol. B 29 (5), 051803 (2011). DOI 10.1116/1.3628640 [PDF]
  75. K. A. Goldberg, I. Mochi, "Actinic Characterization of EUV Bump-Type Phase Defects," J. Vac. Sci. Technol. B 29 (6), 06F502-1-6 (2011). DOI 10.1116/1.3653257 [PDF]
  76. P. P. Naulleau, I. Mochi, K. A. Goldberg, "Optical modeling of Fresnel zoneplate microscopes," Applied Optics 50 (20), 3678-3684 (2011). DOI 10.1364/AO.50.003678 [PDF]
  77. S. A. George, P. P. Naulleau, E. M. Gullikson, I. Mochi, F. Salmassi, K. A. Goldberg, E. H. Anderson, "Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness," SPIE 7969, 79690E (2011). DOI 10.1117/12.881524 [PDF]
  78. S. Huh, I.-Y. Kang, S.-H. Kim, H.-S. Seo, D. Kim, J. Park, S.-S. Kim, H.-K. Cho, K. Goldberg, I. Mochi, T. Shoki, G. Indeerhees, "Printability and inspectability of Defects on the EUV Mask for sub32nm Half Pitch HVM Application," SPIE 7969 796902, (2011). DOI 10.1117/12.879384 [PDF]
  79. I. Mochi, K. A. Goldberg, R. Xie, P.-Y. Yan, K. Yamazoe, "Quantitative evaluation of mask phase defects from through-focus EUV aerial images," SPIE 7969, 79691X (2011). DOI 10.1117/12.881652 [PDF]
  80. K. A. Goldberg, I. Mochi, S. B. Rekawa, N. S. Smith, J. B. Macdougall, P. P. Naulleau, "An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm," SPIE 7969, 79691O (2011). DOI 10.1117/12.881651 [PDF]
  81. 2010

  82. F. Brizuela, S. Carbajo, A. Sakdinawat, Y. Wang, D. Alessi, D. Martz, B. Luther, K. A. Goldberg, D. T. Attwood, B. La Fontaine, J. Rocca, C. Menoni, "Table-top Extreme Ultraviolet Laser Aerial Imaging of Lithographic Masks," in Conference on Laser Electro-Optics: Applications, OSA Technical Digest (CD) (Optical Society of America, 2010) AFA5, (2010). [PDF]
  83. D. T. Wintz, K. A. Goldberg, I. Mochi, S. Huh, "Photon flux requirements for extreme ultraviolet reticle imaging in the 22- and 16-nm nodes," J. Micro/Nanolith. MEMS MOEMS 9 (041205), 041205-1-8 (2010). DOI 10.1117/1.3491512 [PDF]
  84. J. F. Magana, M. Chandhok, T. F. Crimmins, F. A. Ghadiali, T. Liang, G. Zhang, "Current status and challenges in EUV reticle defect detection: a case study of using a real product," BACUS SPIE Photomask 2010 September 15, 2010.
  85. Kenneth A. Goldberg, "EUV Mask Status: Par 13.5," Invited Presentation, SEMATECH Mask Cleaning Workshop, Monterey, CA September 13, 2010.
  86. F. Brizuela, S. Carbajo, A. Sakdinawat, D. Alessi, D. H. Martz, Y. Wang, B. Luther, K. A. Goldberg, I. Mochi, D. T. Attwood, B. La Fontaine, J. J. Rocca, and C. S. Menoni, "Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks," Optics Express 18 (14), 14467-73 (2010). DOI 10.1364/OE.18.014467 [LINK]
  87. K. A. Goldberg, I. Mochi, "Wavelength-Specific Reflections: A Decade of EUV Actinic Mask Inspection Research," J. Vac. Sci. Technol. B 28 (6), C6E1-10 (2010). DOI 10.1116/1.3498757 [PDF]
  88. I. Mochi, K. A. Goldberg, S. Huh, "Actinic imaging and evaluation of phase structures on EUV lithography masks," J. Vac. Sci. Technol. B 28 (6), C6E11-16 (2010). DOI 10.1116/1.3498756 [PDF]
  89. S. A. George, P. P. Naulleau, F. Salmassi, I. Mochi, E. M. Gullikson, K. A. Goldberg, and E. H. Anderson, "Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning," J. Vac. Sci. Technol. B 28 (6), (2010). DOI 10.1116/1.3502436 [PDF]
  90. S. Huh, A. Rastegar, F. Goodwin, S. Wurm, K. Goldberg, I. Mochi, T. Nakajima, M. Kishimoto, M. Komakine, "The Study on the Real Defect on EUV Blankmask and Strategy of EUV Mask Inspection," SPIE 7545 7545N, 1-8 (2010). [PDF]
  91. Y.-J. Fan, L. Yankulin, A. Antohe, P. Thomas, C. Mbanaso, R. Garg, Y. Wang, A. Wüest, F. Goodwin, S. Huh, P. Naulleau, K. Goldberg, I. Mochi, and G. Denbeaux, "Effect of carbon contamination on the printing performance of extreme ultraviolet masks," J. Vac. Sci. Technol. B 28 (2), 321-328 (2010). DOI 10.1116/1.3333434 [PDF]
  92. I.-Y. Kang, H.-S. Seo, B.-S. Ahn, D.-G. Lee, D. Kim, S. Huh, C.-W. Koh, B. Cha, S.-S. Kim, H.-K. Cho, I. Mochi, K. A. Goldberg, "Printability and inspectability study with substrate programmed pit defects in EUV lithography," SPIE 7636, 76361B (2010). DOI 10.1117/12.847956 [PDF]
  93. A. J. R. van den Boogaard, E. Louis, K. A. Goldberg, I. Mochi, F. Bijkerk, "EUV-multilayers on grating-like topographies," SPIE 7636 76362S, 76362S-1-5 (2010). DOI 10.1117/12.846564 [PDF]
  94. Abbas Rastegar, Sean K. Eichenlaub, Arun J. Kadaksham, Byunghoon Lee, Mathiew House, Henry K. Yun, Brian Cha, Kenneth A. Goldberg, Iacopo Mochi, "Particle removal challenges of EUV patterned masks for the sub-22-nm HP node," SPIE 7636, 76360N (2010). DOI 10.1117/12.847056 [PDF]
  95. D. T. Wintz, K. A. Goldberg, I. Mochi, S. Huh, "Photon flux requirements for EUV-reticle imaging microscopy in the 22- and 16-nm nodes," SPIE 7636, 76362L-1-10 (2010). [PDF]
  96. I. Mochi, K. A. Goldberg, B. M. LaFontaine, A. Tchikoulaeva, C. Holfeld , "Actinic imaging of native and programmed defects on a full-field mask," SPIE 7636, 76361A-1-9 (2010). [PDF]
  97. F. Brizuela, S. Carbajo, A. E. Sakdinawat, Y. Wang, D. Alessi, B. M. Luther, W. Chao, Y. Liu, K. A. Goldberg, P. P. Naulleau, E. H. Anderson, D. T. Attwood, Jr., M. C. Marconi, J. J. Rocca, C. S. Menoni, "Improved performance of a table-top actinic full-field microscope with EUV laser illumination," SPIE February 24, 2010.
  98. S. Huh, L. Ren, D. Chan, S. Wurm, K. Goldberg, I. Mochi, T. Nakajima, M. Kishimoto, B. Ahn, I. Kang, J. Park, K. Cho, S.-I. Han, T. Laursen, "A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection," SPIE 7636, 76360K-1-7 (2010). [PDF]
  99. Y-J Fan, L. Yankulin, P. Thomas, C. Mbanaso, A. Antohe, R. Garg, Y. Wang, T. Murray, A. Wüest, F. Goodwin, S. Huh, A. Cordes, P. Naulleau, K. Goldberg, I. Mochi, E. Gullikson, Gregory Denbeaux, "Carbon Contamination Topography Analysis of EUV Masks," SPIE 7636, 76360G-1-8 (2010). DOI 10.1117/12.846996 [PDF]
  100. 2009

  101. A. Tchikoulaeva, U. Okoroanyanwu, O. Wood, B. La Fontaine, C. Holfeld, S. Kini, M.Peikert, C. Boye, C.-S. Koay, K. Petrillo, H. Mizuno, "EUVL Reticle Defectivity Evaluation," SPIE 7271 727117, (2009). DOI 10.1117/12.815525 [PDF]
  102. F. Brizuela, Y. Wang, C. Brewer, F. Pedaci, W. Chao, E. Anderson, Y. Liu, K. Goldberg, P. Naulleau, P. Wachulak, M. Marconi, D. Attwood, J. Rocca, and C. Menoni, "13.2 nm Table-Top Inspection Microscope for Extreme Ultraviolet Lithography Mask Defect Characterization," CLEO/IQEC JFA5, (2009). [PDF]
  103. C. S. Menoni, F. Brizuela, Y. Wang, C. A. Brewer, B. M. Luther, F. Pedaci, P. W. Wachulak, M. C. Marconi, J. J. Rocca, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, D. T. Attwood, A. V. Vinogradov, I. A. Artyukov, Y. P. Pershyn, V. Kondratenko, "Advances in full field microscopy with table-top soft x-ray lasers," SPIE 7451 74510I, (2009). DOI 10.1117/12.826419 [PDF]
  104. C. H. Clifford, T. T. Chan, A. R. Neureuther, K. A. Goldberg I. Mochi, T. Liang, "Investigation of buried EUV mask defect printability using actinic inspection and fast simulation," SPIE 7488 (74882H), (2009). DOI 10.1117/12.829716 [PDF]
  105. S. Huh, P. Kearney, A. Rastegar, F. Goodwin, S. Wurm, K. Goldberg, I. Mochi, T. Nakajima , M. Kishimoto, M. Komakine, "The Study on the Native Real Defect on EUV Mask Blank Using DUV Blank Inspection Tool and SEMATECH AIT," 2009 International Symposium on Extreme Ultraviolet Lithography, Prague October 2009.
  106. P. Naulleau, C. Anderson, L. Baclea-an, P. Denham, S. George, K. Goldberg, B. Hoef, G. Jones, C. Koh, B. La Fontaine, W. Montgomery, T. Wallow, "Using the 0.3-NA SEMATECH Berkeley MET for Sub-22 nm Half Pitch Development," 2009 International Symposium on Extreme Ultraviolet Lithography, Prague October 2009.
  107. H. Seo, B. Ahn, I. Kang, D. Lee, D. Kim, S. Kim, H. Cho, S. Huh, B. Cha, K. Goldberg, "Effects of Multilayer Depositions on the EUV Printability and DUV Inspectability of Substrate Pit Defects," 2009 International Symposium on Extreme Ultraviolet Lithography October 2009.
  108. I. Mochi, K. A. Goldberg, B. LaFontaine, O. Wood II, "Actinic imaging of known native defects on a full-field mask," 2009 International Symposium on Extreme Ultraviolet Lithography October 2009.
  109. K. A. Goldberg, I. Mochi, P. Naulleau, S. George, S. Huh, "Progress in actinic mask imaging: the closest look at lines, defects in phase roughness," 2009 International Symposium on Extreme Ultraviolet Lithography October 2009.
  110. Y.-J. Fan, L. Yankulin, G. P. Denbeaux, A. F. Wüest, F. Goodwin, S. Huh, P. P. Naulleau, K. A. Goldberg, "Impact of carbon contamination on EUV masks," SPIE Photomask (BACUS) September 17.
  111. C. H. Clifford, S. Wiraatmadja, T. T. Chan, A. R. Neureuther, K. A. Goldberg, I. Mochi, T. Liang, "Comparison of fast three-dimensional simulation and actinic inspection for extreme ultraviolet masks with buried defects and absorber features," J. Vac. Sci. Technol. B 27 (6), 2888-93 (2009). DOI 10.1116/1.3244624 [PDF]
  112. H.-S. Seo, B.-S. Ahn, I.-Y. Kang, D. G. Lee, S. Huh, B. Cha, D Kim, S.-S. Kim, H. K. Cho, and K. A. Goldberg, "Effects of multilayer depositions on the EUV printability and DUV inspectability of substrate pit defects," 2009 EUVL Symposium, Prague, Czech Republic October 2009.
  113. F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. Naulleau, P. Wachulak, M. C. Marconi, D. T. Attwood, J. J. Rocca, and C. S. Menoni, "Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination," Optics Letters 34 (3), 271-3 (2009). DOI 10.1364/OL.34.000271 [PDF]
  114. S. Huh, P. Kearney, S. Wurm, F. Goodwin, H. Han, K. Goldberg, Iacopo Mochi, Eric Gullikson, "EUV Actinic Defect Inspection and Defect Printability at the Sub-32 nm Half-pitch," SPIE 7470, 74700Y (2009). [PDF]
  115. H. Mizuno, G. McIntyre, C.-S. Koay, M. Burkhardt, L. He, J. Hartley, C. Johnson, S. Raghunathan, K. Goldberg, I. Mochi, B. La Fontaine, and O. Wood, "Thorough characterization of a EUV mask," Proc. SPIE 7379, 73790J (2009). [PDF]
  116. K. A. Goldberg, I. Mochi, P. Naulleau, T. Liang, P.-Y. Yang, S. Huh, "EUV pattern defect detection sensitivity based on aerial image linewidth measurements," J. Vac. Sci. Technol. B 27 (6), 2916-21 (2009). [PDF]
  117. I.
 Mochi,
 K. 
A. 
Goldberg,
 H. 
Han,
 P.
 Naulleau, 
R. 
Myakawa, 
E.
 H. Anderson, 
J. 
Macdougall, "Using aberration test patterns to optimize the performance of EUV aerial imaging microscopes," J. Vac. Sci. Technol. B .
  118. Y.-J. Fan, L. Yankulin, A. Antohe, R. Garg, P. Thomas, C. Mbanaso, A. Wuest, F. Goodwin, S. Huh, P. Naulleau, K. Goldberg, I. Mochi, G. Denbeaux , "Carbon Contamination of Extreme Ultraviolet (EUV) Masks and its Effect on Imaging," SPIE 7271, 72713U (2009). DOI 10.1117/12.814196 [PDF]
  119. S. Huh, P. Kearney, S. Wurm, F. Goodwin, K. Goldberg, I. Mochi, E. Gullikson, "Mask Defect Verification Using Actinic Inspection and Defect Mitigation Technology," SPIE 7271 72713J, 72713J-1-9 (2009). [PDF]
  120. F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. Naulleau, P. Wachulak, M. C. Marconi, D. T. Attwood, J. J. Rocca, and C. S. Menoni, "Inspection 13.2 nm table-top full-field microscope," SPIE 7271 72713F-1, 72713F-1-7 (2009). DOI 10.1117/12.814320 [PDF]
  121. I. Mochi, K. A. Goldberg, P. Naulleau, S. Huh, "Improving the performance of the Actinic Inspection Tool with an optimized alignment procedure," SPIE 7271 727123, 727123-1-9 (2009). [PDF]
  122. K. A. Goldberg, I. Mochi, S. Huh , "Collecting EUV mask images through focus by wavelength tuning," SPIE 7271 72713N, 72713N-1-8 (2009). DOI 10.1117/12.824433 [PDF]
  123. C. H. Clifford, S. Wiraatmadja, T. T. Chan, A. R. Neureuther, K. A. Goldberg, I. Mochi, T. Liang, "Comparison of fast 3D simulation and actinic inspection for EUV masks with buried defects," SPIE 7271 72711F, (2009). DOI 10.1116/1.3244624 [PDF]
  124. 2008

  125. S. Huh, S. Wurm, H. Han, K. Goldberg, I. Mochi, "EUV Actinic Defect Inspection and Imaging For the Sub-32 nm Half-pitch," EUVL Symposium 2008 September 2008.
  126. H. Han, H. Seo, K. Goldberg, H. Kim, B. Ahn, I. Kang, W. Cho, S. Lee, G. Kim, D. Kim, S. Kim, H. Cho, "Characterization of EUV Mask Defects: Printability and Repair Process," EUVL Symposium 2008 September 2008.
  127. U. Okoroanyanwu, B. LaFontaine, O. Wood, G. Antesberger, C. Holfeld, J. Hendrik Peters, E. Langer, M. Bender, M. Rossiger, S. Trogisch, F. Goodwin, G. Denbeaux, Y. Fan, A. Antohe, L. Yankulin, R. Garg, K. Goldberg, "EUV Reticle Contamination and Cleaning," EUVL Symposium 2008 September 2008.
  128. P. Naulleau, K. Goldberg, I. Mochi, G. Zhang, "Mask Effects on LER," EUVL Symposium 2008 September 2008.
  129. I. Mochi, K. A. Goldberg, P. Naulleau, S. Huh, "Achieving Diffraction-limited EUV Aerial Image Microscopy," EUVL Symposium 2008 September 2008.
  130. K. A. Goldberg, I. Mochi, P. Naulleau, B. LaFontaine, S. Huh, "Aerial Image Linewidth Measurement Capabilities of the Actinic Inspection Tool," EUVL Symposium 2008 September 2008.
  131. K. A. Goldberg, P. Naulleau, I. Mochi, E. H. Anderson, S. B. Rekawa, C. D. Kemp, and R. F. Gunion, H.-S. Han, S. Huh , "Actinic extreme ultraviolet mask inspection beyond 0.25 numerical aperture," J. Vac. Sci. Technol. B 26 (6), 2220-4 (2008). [PDF]
  132. K. A. Goldberg, I. Mochi, P. P. Naulleau, H.-S. Han, S. Huh, "Benchmarking EUV mask inspection beyond 0.25 NA," SPIE Photomask (BACUS) 7122, 71222E-1 (2008). [PDF]
  133. K. A. Goldberg, "EUV mask inspection: a bright idea?," 2008 International Workshop on EUV Lithography , (2008).
  134. K. A. Goldberg, K. Takase, P. Naulleau, H.-S. Han, A. Barty, H. Kinoshita, K. Hamamoto, "Evaluating EUV-mask pattern imaging with two EUV microscopes," Proc. SPIE .
  135. K. A. Goldberg, S. B. Rekawa, C. D. Kemp, A. Barty, E. H. Anderson, P. Kearney, H. Han, "EUV-mask reflectivity measurements with micron-scale spatial resolution," Proc. SPIE 6921, 69213U (2008). [PDF]
  136. H.-S. Han, W. Cho, K. A. Goldberg, E. M. Gullikson, C.-U. Jeon, S. Wurm, "Determining the critical size of EUV-mask substrate defects," Proc. SPIE 6921, 69211Y (2008). [PDF]
  137. 2007

  138. G.-S. Yoon, H. Kim, H.-J. Oh, H.-S. Kim, H.-S. Sim, S.-H. Lee, G.-B. Kim, S.-M. Huh, K. A. Goldberg, A. Barty, S.-S. Kim, H.-K. Cho, "Evaluation of EUV Mask Repair Methods in Si-capping & Ru-capping Blanks," EUVL Symposium 2007, Sapporo, Japan October 31, 2007.
  139. K. A. Goldberg, P. Naulleau, A. Barty, S. Rekawa, C. D. Kemp, R. Gunion, F. Salmassi, E. Gullikson, E. Anderson, H.-S. Han, "Benchmarking Mask Imaging with the Actinic Imaging Tool," EUVL Symposium 2007, Sapporo, Japan October 29, 2007.
  140. W. Cho, H.-S. Han, K. A. Goldberg, P. A. Kearney, C.-U. Jeon , "Detectability and printability of EUVL-mask blank defects for the 32-nm HP node ," Proc. SPIE Photomask (BACUS) 6730 673013, 673013-1-9 (2007). [PDF]
  141. K. A. Goldberg, P. P. Naulleau, A. Barty, S. B. Rekawa, C. D. Kemp, R. F. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, H.-S. Han, "Performance of actinic EUVL mask imaging using a zoneplate microscope ," Proc. SPIE Photomask (BACUS) 6730 67305E, 67305E-1-12 (2007). [PDF]
  142. H. Han, K. A. Goldberg, A. Barty, E. M. Gullikson, Y. Ikuta, T. Uno, O. R. Wood II, and S. Wurm, "EUV MET printing and actinic imaging analysis on the effects of phase defects on wafer CDs," Proc. SPIE 6517, 65170B-1-10 (2007). [LINK]
  143. K. A. Goldberg, A. Barty, P. Seidel, K. Edinger, R. Fettig, P. Kearney, H. Han, O. R. Wood II , "EUV and non-EUV inspection of reticle defect repair sites," Proc. SPIE 6517, 65170C-1-7 (2007). [PDF]
  144. 2006

  145. A. Barty, K. A. Goldberg, P. Kearney, S. B. Rekawa, B. LaFontaine, O. Wood II, J. S. Taylor and H.-S. Han, "Multilayer defects nucleated by substrate pits: a comparison of actinic inspection and non-actinic inspection techniques," SPIE 6349, 63492M (2006). [PDF]
  146. K. A. Goldberg, A. Barty, H. Han., S. Wurm, P. Kearney, P. Seidel, O. R. Wood II, B. LaFontaine, T. Liang, C. Holfeld, R. Fettig, Y. Tezuka, T. Terasawa, "Comparison of actinic and non-actinic inspection of programmed defect masks," EUVL Symposium 2006 October 18, 2006. [LINK]
  147. K. A. Goldberg, A. Barty, Y. Liu, P. Kearney, Y. Tezuka, T. Terasawa, J. S. Taylor, H.-S. Han, and O. R. Wood II , "Actinic Inspection of EUV Programmed Multilayer Defects and Cross-Comparison Measurements," Journal of Vacuum Science and Technology B 24 (6), 2824-28 (2006). [PDF]
  148. 2005

  149. G. Denbeaux, E. Garg, A. Barty, Y. Liu, K. Goldberg, O. Wood, "Extreme Ultraviolet Phase Contrast Imaging of Mask Defects," 2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9.
  150. A. Barty, Y. Liu, K. A. Goldberg, E. M. Gullikson, J. S. Taylor, and O. R. Wood II, "Actinic inspection of multilayer coated EUV masks at the ALS," 2005 International Symposium on Extreme Ultraviolet Lithography, San Diego, CA November 7-9, 2005.
  151. 1998

  152. D. Attwood, E. Anderson, P. Batson, R. Beguiristain, J. Bokor, K. Goldberg, E. Gullikson, K. Jackson, K. Nguyen, M. Koike, H. Medecki, S. Mrowka, R. Tackaberry, E. Tejnil, and J. Underwood, "At-wavelength metrologies for extreme ultraviolet lithography," Future Electron Devices Journal Vol. 9 (Suppl. 1), 5-14 (1998). [PDF]